European Materials Research Society |
Cracow University of Technology Poland SYMPOSIUM A: SOFTWARE DEVELOPMENT FOR PROCESS AND MATERIALS DESIGN E-MRS FALL MEETING Sept 15-19, 2002 Cracow |
| European Materials Research Society |
Cracow University of Technology Poland SYMPOSIUM A: SOFTWARE DEVELOPMENT FOR PROCESS AND MATERIALS DESIGN E-MRS FALL MEETING Sept 15-19, 2002 Cracow |
Exponential growth in computer power and accessibility, impressive developments in software, and the arrival of intuitive graphical user interfaces made computers an indispensable tool for theoreticians and experimentalists alike. In many cases, the distinction between computer-aided modeling and experiment is effectively blurred as the most complex experiments now require elaborate computational and visualization approaches as an integral part of their interpretation and derivation of numeric results.
Moreover, computational materials science has matured to the point that technological problems related to materials design, processing, and chemical synthesis are being investigated on computers often before conducting expensive and time-consuming experiments. The predominant research model is now based on series of steps in which experiments are used to refine the working model, and the model suggests which experiments to do next to further understand the underlying problem. Such an approach shortens the development cycle and saves money, i.e., provides the competitive edge.
But theory and experiment cannot live on their own, and bear fruit. They require that "modelers" and "experimentalists" communicate, appreciate, and understand the needs, options, and constraints of their colleagues. In this spirit this symposium brings together developers and users of software for process and material design. This occasion will foster and strengthen the scientific and commercial partnership between Western and Eastern Europe and promote the collaboration with the world leading materials science software design centers and materials scientists in commercial, academic, and governmental sectors.
Explosive growth in software development for computational materials research resulted in diverse and extensive fields of study. Because of time constraints, papers describing developments in methodology will be given a high priority. Modeling and simulation for process and materials design is relevant to many technologies, including:
A wide variety of methodologies are used to approach problems in these research fields, for example,
are all currently being used in materials design and the list constantly grows.
The methods listed above are used to study the following chemical systems:
Computational approaches to materials and process design are being developed
at an incredible pace. This symposium will help to guide theoreticians
and experimentalists alike through the maze of approaches currently being used.
Papers presenting background material will be followed by practical
implementations of methodology and, if warranted, the representative
examples of applications. The organizers will also invite vendors to present
tutorials and demonstrate existing software. We welcome papers and
presentations that bridge the computational methodologies and research areas
listed above, and provide new insights into computational methods and their
intended application domain in materials and process design. For further
details on submission, registration, and program please visit:
http://www.AtomicScaleDesign.Net/emrs/fall2002/
or the main pages of the 2002 E-MRS Fall meeting at:
http://www.pk.edu.pl/fm
and
http://www-emrs.c-strasbourg.fr.
Please do not hesitate to contact the organizers of the symposium by e-mail at chairs@asdn.net or chairs@AtomicScaleDesign.Net if you have questions or suggestions.
Please also consider joining us at the other symposium with similar focus during the E-MRS 2002 Spring Meeting in June 2002. This symposium incporporates the same group of people who are running the www.AtomicScaleDesign.Net discussion forum and web site. Spring Symposium A is complimentary to the current one and is stressing applications.
Our Sponsors |
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Jan K. Labanowski Ohio Supercomputer Center 1224 Kinnear Rd Columbus, OH 43212-1163 USA Tel. +1 614-292-9279 FAX +1 614-292-7168 E-mail: jkl@ccl.net WWW: http://www.osc.edu Jim Greer National Microelectronics Research Centre, University College Lee Maltings Prospect Row Cork Ireland Tel. +353 21 904345 FAX: +353 21 270271 E-mail:WWW: http://www.nmrc.ie/research/computational-modelling-group Anatoli A. Korkin Advanced Modeling & Simulation Semiconductor Products Sector Motorola Inc., MD M36 2200 W. Broadway Road Mesa, AZ 85202 USA Tel. +1 480 655-3171 FAX +1 480 655-5013 E-mail:
WWW: http://www.digitaldna.com Stanislaw A. Kucharski Institute of Chemistry University of Silesia 9, Szkolna Street 40-006 Katowice POLAND Tel.: +48 32 359-1560 Fax : +48 32 359-9978 E-mail:
WWW: http://www.us.edu.pl/uniwersytet/english/index.shtml