We describe our integrated framework for photolithographic simulation, binary proximity correction, and phase shift mask design. Our integrated framework supports processing of Stream format, visualization and complicated analysis of VLSI topology, aerial image intensity calculation and several algorithms for proximity correction. Aerial image simulation algorithm uses rapid computational techniques in Fourier domain. Binary proximity correction algorithm uses simple efficient heuristics for serifs placement. Phase shift mask generation algorithm uses new efficient algorithm for phase assignment in dark field alternating PSM. At last we discuss experimental results, received for automatically generated PSM.